Control of Pathogenic Staphylococcus aureus Growth by Using Antibiotics and Chemical Elements

Authors

  • Mohamed Ezz El-Din Department of Botany and Microbiology, Faculty of Science, Cairo University, Giza, Egypt.
  • Mohamed Eweis Department of Botany and Microbiology, Faculty of Science, Cairo University, Giza, Egypt.
  • Maha A. Khalaf Clinical and Chemical Pathology Department, Faculty of Medicine, Cairo University, Egypt.
  • Radwa Hegazy Department of Botany and Microbiology, Faculty of Science, Cairo University, Giza, Egypt.

Keywords:

S. aureus resistance, Antibiotic resistance, Metal resistance, antimicrobial effect, markers

Abstract

The aim of this study was to control of resistant Staphylococcus aureus by antibiotics with some chemical elements. MERSA strain was chosen, isolated and identified by vitek. Of 5 antibiotics chosen, the isolate was resistant to 2 antibiotics (Ampicillin/Sulbactam and Ceftazidime) moderate to 2 antibiotics (Ceftriaxone and Rifampicin) and sensitive to only one antibiotic (Ofloxacin). And of 15
chemical elements applied, S. aureus was resistant to 12 elements and only 3 ones gave low sensitivity with inhibition zones about 7 mm or 6 mm in the diameter to it. Different concentrations were prepared from each chemical elements and mixed with each antibiotic separately. The antibiotics to which bacteria was resistant, gave high sensitivity to it after adding the chemical elements with inhibition zones reaching 20 and 30 mm in diameter. In the moderate antibiotics, the inhibition zones were increased for one antibiotic (Ceftriaxone) and the other antibiotic (Rifampicin) increased with some elements and decreased with other elements in different concentrations. In the sensitive antibiotic (Ofloxacin), the inhibition zones were increased with some elements and decreased with the others in different concentrations.

Published

30.03.2024